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Journal of Micro/Nanolithography, MEMS, and MOEMS

Source for extreme ultraviolet lithography by the tabletop storage ring MIRRORCLE
Author(s): Hironari Yamada; Dorian Minkov; Norio Toyosugi; Masaki Morita; Daisuke Hasegawa; Ahsa Moon; Ejike Kenneth Okoye
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Paper Abstract

Advances of electron storage rings to beam currents of above 1 A and tabletop sizes make possible the development of a synchrotron-based source for EUV lithography (EUVL) at ~13.5-nm wavelength. The MIRRORCLE storage rings can provide on average 3-A electron beam current, 1-min lifetime, 15-ms radiation damping, and beam size ~3*3 mm2. MIRRORCLE-20SX, MIRRORCLE-6X, and MIRRORCLE-CV4 store electrons with energies of 20 MeV, 6 MeV, and 4 MeV, respectively. These machines can emit EUV from a tiny target, hit by the circulating beam, via transition radiation or diffusive radiation. Using a multilayer microelectromechanical system (MEMS) target allows enhancement and spectral purification of the emitted EUV. Aligning many such MEMS along the electron beam orbit and radiation collection by only one quasi-elliptical EUV mirror can provide EUV satisfying the joint requirements for an EUVL source.

Paper Details

Date Published: 1 October 2008
PDF: 6 pages
J. Micro/Nanolith. 7(4) 043004 doi: 10.1117/1.3040017
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 7, Issue 4
Show Author Affiliations
Hironari Yamada, Ritsumeikan Univ. (Japan)
Dorian Minkov, Ritsumeikan Univ. (Japan)
Norio Toyosugi, Ritsumeikan Univ. (Japan)
Masaki Morita, Ritsumeikan Univ. (Japan)
Daisuke Hasegawa, Ritsumeikan Univ. (Japan)
Ahsa Moon, Ritsumeikan Univ. (Japan)
Ejike Kenneth Okoye, Ritsumeikan Univ. (Japan)

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