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Journal of Micro/Nanolithography, MEMS, and MOEMS

Isopropanol/water as a developer for poly(dimethylglutarimide)
Author(s): Robert William Johnstone; Ian G. Foulds; M. Pallapa; Ash M. Parameswaran
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Paper Abstract

Poly(dimethylglutarimide) (PMGI) is a resist that is commonly used in bilayer and trilayer imaging applications. PMGI can be exposed using various radiation sources including deep UV. Currently, there are only two developers for PMGI reported in the literature: tetramethylammonium hydroxide and tetraethylammonium hydroxide. We introduce a new developer for PMGI, a mixture of isopropanol (IPA) and water. Samples were irradiated with deep UV at 254 nm. The IPA/water developer exhibits rapid dissolution of exposed PMGI, of many microns per minute. However, PMGI exhibits high absorption at 254 nm, so the development depth is limited. The depth limit, after a critical dose, increases linearly with the exposure dose.

Paper Details

Date Published: 1 October 2008
PDF: 5 pages
J. Micro/Nanolith. MEMS MOEMS 7(4) 043006 doi: 10.1117/1.2990738
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 7, Issue 4
Show Author Affiliations
Robert William Johnstone, Simon Fraser Univ. (Canada)
Ian G. Foulds, Simon Fraser Univ. (Canada)
M. Pallapa, Simon Fraser Univ. (Canada)
Ash M. Parameswaran, Simon Fraser Univ. (Canada)

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