Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS

Role of surfactants in adhesion reduction for step and flash imprint lithography
Author(s): Michael W. Lin; Daniel J. Hellebusch; Kai Wu; Eui K. Kim; Kuan-Hsun Lu; Kenneth M. Liechti; John G. Ekerdt; Paul S. Ho; C. Grant Willson
Format Member Price Non-Member Price
PDF $20.00 $25.00

Paper Abstract

The step-and-flash imprint lithography process requires the clean separation of a quartz template from a polymer, and the force required to create this separation must be minimized to prevent the generation of defects. Fluorinated surfactant additives to the imprint fluid address this problem by migrating to the template-polymer interface and forming a local layer with ideal properties for adhesive fracture. Tensile and four-point bend fracture experiments show that surfactants lower the modulus of the imprint polymer and decrease the fracture energy. The fracture energy is further decreased by using a nonreactive, liquid surfactant versus a surfactant that reacts with the polymer matrix. Angle-resolved x-ray photoelectron spectroscopy results indicate that surfactant migration is more effective with a fluorinated surface treatment compared to an untreated quartz surface. This result shows that the use of fluorinated surfactants must be accompanied by a surface treatment that produces a similar energy or polarity to induce migration and lower the adhesive strength.

Paper Details

Date Published: 1 July 2008
PDF: 8 pages
J. Micro/Nanolith. 7(3) 033005 doi: 10.1117/1.2968269
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 7, Issue 3
Show Author Affiliations
Michael W. Lin, The Univ. of Texas at Austin (United States)
Daniel J. Hellebusch, The Univ. of Texas at Austin (United States)
Kai Wu, The Univ. of Texas at Austin (United States)
Eui K. Kim, The Univ. of Texas at Austin (United States)
Kuan-Hsun Lu, The Univ. of Texas at Austin (United States)
Kenneth M. Liechti, The Univ. of Texas at Austin (United States)
John G. Ekerdt, The Univ. of Texas at Austin (United States)
Paul S. Ho, The Univ. of Texas at Austin (United States)
C. Grant Willson, The Univ. of Texas at Austin (United States)


© SPIE. Terms of Use
Back to Top