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Journal of Micro/Nanolithography, MEMS, and MOEMS

Novolak resins and the microelectronic revolution
Author(s): Stanley F. Wanat; Robert Plass; M. Dalil Rahman
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Paper Abstract

Novolak resins have had a significant impact on modern life, in general, and more specifically, on photolithography and the microelectronic market in particular. Since their commercialization around 1910, they have found a wide variety of uses. With the switch from solvent developable negative photoresists to the base soluble novolak/diazonaphthoquinone systems, the growth of the resist market has skyrocketed. Successive generations of higher quality resists required refinements in the synthesis, fractionation and purification of the novolak resins used in making those resists. The use of stabilization techniques and continuous processing methods for the preparation of novolak resins and the resists made with them are discussed.

Paper Details

Date Published: 1 July 2008
PDF: 11 pages
J. Micro/Nanolith. 7(3) 033008 doi: 10.1117/1.2968268
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 7, Issue 3
Show Author Affiliations
Stanley F. Wanat, AZ Electronic Materials USA Corp. (United States)
Robert Plass, AZ Electronic Materials USA Corp. (United States)
M. Dalil Rahman, AZ Electronic Materials USA Corp. (United States)


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