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Journal of Micro/Nanolithography, MEMS, and MOEMS

Temperature dependence of Mo-Au Gibbsian segregating alloys
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Paper Abstract

critical challenge for the success of extreme ultraviolet (EUV) lithography is to prevent collector mirror surface damage and reflectivity loss. Plasma debris and radiation damage the mirror and degrade the reflectivity. We study an innovative approach to the design and fabrication of collector mirror surface materials to improve collector lifetime. A Mo-Au Gibbsian segregation (GS) alloy is developed on silicon using a dc dual-magnetron cosputtering system, and the temperature effect on mirror damage is investigated. Result shows that a thin Au segregating layer is maintained during exposure, even though overall erosion is taking place. The reflective material underneath the segregating layer, Mo, is protected by the Au sacrificial layer, which is preferentially sputtered. Both theoretical and experimental studies have been performed to prove the effectiveness of the GS alloys for use as an EUV collector optics material.

Paper Details

Date Published: 1 July 2008
PDF: 10 pages
J. Micro/Nanolith. MEMS MOEMS 7(3) 033004 doi: 10.1117/1.2964218
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 7, Issue 3
Show Author Affiliations
Huatan Qiu, Univ. of Illinois at Urbana-Champaign (United States)
S. N. Srivastava, Univ. of Illinois at Urbana-Champaign (United States)
Keith C. Thompson, Univ. of Illinois at Urbana-Champaign (United States)
Martin John Neumann, Univ. of Illinois at Urbana-Champaign (United States)
David Neil Ruzic, Univ. of Illinois at Urbana-Champaign (United States)


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