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Journal of Biomedical Optics

Risk estimation of skin damage due to ultrashort pulsed, focused near-infrared laser irradiation at 800 nm
Author(s): Frank F. Fischer; Beate Volkmer; Stefan Puschmann; Ruediger Greinert; Wolfgang Breitbart; J. Kiefer; R. Wepf
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Paper Abstract

New imaging techniques using near-infrared (NIR) femtosecond lasers (fs-lasers) in multiphoton laser scanning microscopy (MPLSM) have great potential for in vivo applications, particularly in human skin. However, little is known about possible risks. In order to evaluate the risk, a “biological dosimeter” was used. We irradiated fresh human skin samples with both an fs-laser and a solar simulator UV source (SSU). DNA damage introduced in the epidermis was evaluated using fluorescent antibodies against cyclobutane-pyrimidin-dimers (CPDs) in combination with immunofluorescence image analysis. Four fs-irradiation regimes (at 800-nm wavelength) were evaluated differing in laser power and step width of horizontal scans. Fs-irradiation did not give CPDs at 15-mW or 30-mW irradiation power using 10 horizontal scans every 5 microns. CPDs could be seen at 60-mW laser power and 5-µm step size and at 35-mW using 1-micron step width. Quantitative comparison of SSU-induced CPDs showed that the 60-mW laser irradiation regime is comparable to UV-irradiation, giving 0.6 minimal erythemal dose (MED). The 1-micron irradiation regime was comparable to 0.45 MED. Under these experimental conditions, the risk of DNA damage due to fs-laser irradiation on skin is in the range of natural UV-exposure.

Paper Details

Date Published: 1 July 2008
PDF: 8 pages
J. Biomed. Opt. 13(4) 041320 doi: 10.1117/1.2960016
Published in: Journal of Biomedical Optics Volume 13, Issue 4
Show Author Affiliations
Frank F. Fischer, Beiersdorf AG (Germany)
Beate Volkmer, Dermatologisches Zentrum Buxtehude (Germany)
Stefan Puschmann, Beiersdorf AG (Germany)
Ruediger Greinert, Dermatologisches Zentrum Buxtehude (Germany)
Wolfgang Breitbart, Dermatologisches Zentrum Buxtehude (Germany)
J. Kiefer, Justus-Liebig-Univ. Giessen (Germany)
R. Wepf, Beiersdorf AG (Germany)


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