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Optical Engineering

Synthesis algorithm based on overcomplete wavelet expansion for line scratch restoration in old films
Author(s): Jin Xu; Jun Sun; Xingdong Wang; Li Chen
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Paper Abstract

Digitalized old films are often degraded by some annoying defects, one of the most common artifacts being line scratches. We present an effective synthesis algorithm for line scratch detection and removal in the overcomplete wavelet expansion (OWE) domain, which is called the OWE-based synthesis algorithm (OSA). OWE is adopted here because of its higher precision in localization than other decimated wavelets. In the detection part, an improved OWE-based cross section method is proposed to find primary line scratches. A morphological refinement method follows, and includes more secondary line scratches. For better scratch removing results, we adopt a pixel-set-based linear interpolation under the criteria of linear minimum square error (LMSE) estimation in every scale. Experimental results show that compared with some classic algorithms, the proposed method can provide higher accuracy and fewer false alarms in line scratch detection, as well as enhanced restoration results.

Paper Details

Date Published: 1 June 2008
PDF: 10 pages
Opt. Eng. 47(6) 067004 doi: 10.1117/1.2947562
Published in: Optical Engineering Volume 47, Issue 6
Show Author Affiliations
Jin Xu, Shanghai Jiao Tong Univ. (China)
Jun Sun, Shanghai Jiao Tong Univ. (China)
Xingdong Wang, Shanghai Jiao Tong Univ. (China)
Li Chen, Shanghai Jiao Tong Univ. (China)


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