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Optical Engineering

Frequency analysis of maskless lithography system for generation of continuous phase patterns with homogeneous structure depth
Author(s): Carsten Glasenapp; Hans Zappe
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Paper Abstract

A new approach for the fabrication of continuous-relief diffractive phase patterns is presented. The approach is based on a maskless lithography system with reflective liquid crystal displays that is able to expose continuous and binary reliefs in photoresist with a resolution of 3.4 μm. Due to a spatial frequency analysis of the entire exposure system, a compensation transformation may be applied to the input data, which results in constant structure depths independent of spatial frequencies.

Paper Details

Date Published: 1 February 2008
PDF: 7 pages
Opt. Eng. 47(2) 023002 doi: 10.1117/1.2870103
Published in: Optical Engineering Volume 47, Issue 2
Show Author Affiliations
Carsten Glasenapp, Albert-Ludwigs-Univ. Freiburg (Germany)
Hans Zappe, Albert-Ludwigs-Univ. Freiburg (Germany)


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