Journal of Micro/Nanolithography, MEMS, and MOEMSNonlinear interferometric lithography for arbitrary two-dimensional patterns
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A new, relatively simple experimental technique for generating arbitrary, two-dimensional patterns with high visibility and higher resolution than allowed by the Rayleigh criterion has been developed. The theoretical and experimental details of the method, based on repeated phase-coherent interference of four beams on a multiphoton absorber, are described. A sample pattern generated by numerical computer simulation of the technique is also shown.