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Journal of Micro/Nanolithography, MEMS, and MOEMS

Nonlinear interferometric lithography for arbitrary two-dimensional patterns
Author(s): Sean J. Bentley
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Paper Abstract

A new, relatively simple experimental technique for generating arbitrary, two-dimensional patterns with high visibility and higher resolution than allowed by the Rayleigh criterion has been developed. The theoretical and experimental details of the method, based on repeated phase-coherent interference of four beams on a multiphoton absorber, are described. A sample pattern generated by numerical computer simulation of the technique is also shown.

Paper Details

Date Published: 1 January 2008
PDF: 4 pages
J. Micro/Nanolith. 7(1) 013004 doi: 10.1117/1.2838591
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 7, Issue 1
Show Author Affiliations
Sean J. Bentley, Adelphi Univ. (United States)


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