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Journal of Micro/Nanolithography, MEMS, and MOEMS

Photolithographic patterning of bihelical tracks onto conical substrates
Author(s): Alan Purvis; Richard McWilliam; Simon Johnson; Nicholas L. Seed; Gavin L. Williams; Andrew Maiden; Peter Ivey
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Paper Abstract

We demonstrate the direct photolithographic patterning of a grossly nonplanar substrate by creating 62-μm helical tracks on a 22-mm-high cone. The projection of focused light onto the 3-D surface is achieved using a computer-generated hologram (CGH) suitably illuminated so as to create the required pattern on the photoresist-coated surface. The approach adopted forms the basis of a novel method for patterning nonplanar structures. We address the key challenges encountered for the implementation of holographic photolithography in three dimensions, including mask design and manufacture, exposure compensation, mask alignment, and chemical processing. Control of linewidth and resolution over the nonplanar surface is critical. We describe the methods adopted and critically assess the structures created by this process. The bihelical cone is representative of a broadband, high-frequency coil-like structure, known in wireless communications as a log-periodic antenna.

Paper Details

Date Published: 1 October 2007
PDF: 4 pages
J. Micro/Nanolith. MEMS MOEMS 6(4) 043015 doi: 10.1117/1.2824377
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 6, Issue 4
Show Author Affiliations
Alan Purvis, Univ. of Durham (United Kingdom)
Richard McWilliam, Univ. of Durham (United Kingdom)
Simon Johnson, Univ. of Durham (United Kingdom)
Nicholas L. Seed, Sheffield Hallam Univ. (United Kingdom)
Gavin L. Williams, Univ. of Sheffield (United Kingdom)
Andrew Maiden, The Univ. of Sheffield (United Kingdom)
Peter Ivey, Innotec Ltd. (United Kingdom)

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