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Journal of Micro/Nanolithography, MEMS, and MOEMS

Modeling and optimization of debris mitigation systems for laser and discharge-produced plasma in extreme ultraviolet lithography devices
Author(s): Valeryi A. Sizyuk; Ahmed Hassanein; Vivek Bakshi
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Paper Abstract

Physical models are developed to investigate the following conditions relevant to discharge-produced plasma (DPP) devices under development for extreme ultraviolet (EUV) lithography: gaseous jet propagation in the chamber, removal of neutral particles with a gaseous jet, and deviation of charged particles with a magnetic field. Several geometries of the mitigation systems are considered for removing debris during the EUV lithographic process. The design of a mitigation system is proposed and simulated with the computer models. The behavior of Xe, Li, and Sn debris in Ar and He jets is simulated by using the high energy interaction with general heterogeneous target systems (HEIGHTS) integrated package. Final energy and local distributions are calculated using experimental debris data from current EUV facilities.

Paper Details

Date Published: 1 October 2007
PDF: 6 pages
J. Micro/Nanolith. 6(4) 043003 doi: 10.1117/1.2804128
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 6, Issue 4
Show Author Affiliations
Valeryi A. Sizyuk, Argonne National Lab. (United States)
Ahmed Hassanein, Argonne National Lab. (United States)
Vivek Bakshi, SEMATECH, Inc. (United States)


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