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Journal of Nanophotonics

Metallized slit-shaped pyramidal Si probe with extremely high resolution for 1.5-Tbit/in2 density near-field optical storage
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Paper Abstract

We have developed a near-field optical probe by introducing the metallized pyramidal structure of a Si probe with a slit-shaped tip for high-density optical storage. Numerical analysis using the finite-difference time-domain method showed that the optical spot generated at the aperture measured 13×30 nm. We fabricated a slit-type Si probe and evaluated the spot size using fluorescence imaging of a single dye molecule. The full-width at half maximum of the signal profiles was 16 nm×26 nm, which corresponds to a data density of 1.5 Tbit/in2. Furthermore, a large extinction coefficient depending on the polarization was confirmed.

Paper Details

Date Published: 1 September 2007
PDF: 7 pages
J. Nanophoton. 1(1) 011550 doi: 10.1117/1.2794357
Published in: Journal of Nanophotonics Volume 1, Issue 1
Show Author Affiliations
Takashi Yatsui, Japan Science and Technology Agency (Japan)
Wataru Nomura, The Univ. of Tokyo (Japan)
Motoichi Ohtsu, The Univ. of Tokyo (Japan)


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