Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Resolution Enhancement Techniques and Design for Manufacturability: Containing and Accounting for Variabilities in Integrated Circuit Creation
Author(s): Alfred K. K. Wong

Paper Abstract

This PDF file contains the editorial “Resolution Enhancement Techniques and Design for Manufacturability: Containing and Accounting for Variabilities in Integrated Circuit Creation” for JM3 Vol. 6 Issue 03

Paper Details

PDF
J. Micro/Nanolith. 6(3) 031001 doi: 10.1117/1.2784723
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 6, Issue 3, July 2007
Show Author Affiliations

© SPIE. Terms of Use
Back to Top