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Journal of Micro/Nanolithography, MEMS, and MOEMS

Micro-electromechanical systems variable optical attenuator based on nonsilicon surface micromachining technology
Author(s): Xuhan Dai; Xiaolin Zhao; Guifu Ding; Bingchu Cai
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Paper Abstract

A novel, electromagnetically driven variable fiber optic attenuator based on micro-electromechanical system (MEMS) technology is described. The attenuation level is adjusted by changing the microshutter position in the optical path. A new technique, termed "nonsilicon surface micromachining," is used to fabricate the shutter, in which a copper layer was used as the sacrificial layer, and the electroplated FeNi as the structure layer. This scheme provides another way to fabricate the optical microstructure. The optical characteristics of the attenuator are theoretically analyzed, and the result is verified by experiments. The MEMS attenuator has fiber-to-fiber insertion loss less than 3 dB at 1550-nm wavelength, dynamic range greater than 40 dB, 0.2-dB repeatability, and return loss better than 40 dB.

Paper Details

Date Published: 1 April 2007
PDF: 7 pages
J. Micro/Nanolith. 6(2) 023010 doi: 10.1117/1.2750653
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 6, Issue 2
Show Author Affiliations
Xuhan Dai, Shanghai Jiao Tong Univ. (China)
Xiaolin Zhao, Shanghai Jiao Tong Univ. (China)
Guifu Ding, Shanghai Jiao Tong Univ. (China)
Bingchu Cai, Shanghai Jiao Tong Univ. (China)


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