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Journal of Micro/Nanolithography, MEMS, and MOEMS

Progress on implementation of a reference measurement system based on a critical-dimension atomic force microscope
Author(s): Ndubuisi George Orji; Ronald G. Dixson; Angela Martinez; Benjamin D. Bunday; John A. Allgair; Theodore V. Vorburger
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Paper Abstract

The National Institute of Standards and Technology (NIST) and SEMATECH are working to address traceability issues in semiconductor dimensional metrology. In semiconductor manufacturing, many of the measurements made in the fab are not traceable to the SI unit of length. This is because a greater emphasis is often placed on precision and tool matching than on accuracy. Furthermore, the fast pace of development in the industry makes it difficult to introduce suitable traceable standard artifacts in a timely manner. To address this issue, NIST and SEMATECH implemented a critical-dimension atomic-force-microscope-based reference measurement system (RMS). The system is calibrated for height, pitch, and width, and has traceability to the SI definition of length in all three axes. Because the RMS is expected to function at a higher level of performance than inline tools, the level of characterization and handling of uncertain sources is on a level usually seen in instruments at national measurement institutes. In this work, we discuss recent progress in reducing the uncertainty of the instrument as well as details of a newly implemented performance monitoring system. We also present an example of how the RMS concept can be used in a semiconductor manufacturing environment.

Paper Details

Date Published: 1 April 2007
PDF: 10 pages
J. Micro/Nanolith. 6(2) 023002 doi: 10.1117/1.2728742
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 6, Issue 2
Show Author Affiliations
Ndubuisi George Orji, National Institute of Standards and Technology (United States)
Ronald G. Dixson, National Institute of Standards and Technology (United States)
Angela Martinez, Advanced Technology Development Facility, Inc. (United States)
Benjamin D. Bunday, International SEMATECH Manufacturing Initiative (United States)
John A. Allgair, International SEMATECH Manufacturing Initiative (United States)
Theodore V. Vorburger, National Institute of Standards and Technology (United States)


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