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Optical Engineering • Open Access

Fabrication of Yb3+:Er3+ co-doped Al2O3 ridge waveguides by the dry etching
Author(s): Qi Song; Jinsong Gao; Xiaoyi Wang; Hong Chen; Xuanming Zheng; Tongtong Wang; Cheng-Ren Li; Changlie Song

Paper Abstract

We present the fabrication process of straight-ridge Yb3+:Er3+ co-doped Al2O3 waveguides. Thin films are synthesized on silica-on-silicon wafers by middle frequency sputtering (MFS) and microwave ECR (MW-ECR) plasma source deposition. Waveguides are developed by reactive plasma etching employing BCl3 gas. Photoluminescence (PL) spectrum and gain measurements at 1.53 μm are investigated at room temperature: a net gain of 5.225 dB/cm is achieved from a 10.5-mm-long waveguide obtained by MFS, and 0.043 dB/cm is achieved from a MW-ECR with a 980-nm pump power of 62 mW.

Paper Details

Date Published: 1 April 2007
PDF: 3 pages
Opt. Eng. 46(4) 040509 doi: 10.1117/1.2721529
Published in: Optical Engineering Volume 46, Issue 4
Show Author Affiliations
Qi Song, Dalian Univ. of Technology (China)
Jinsong Gao, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Xiaoyi Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Hong Chen, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Xuanming Zheng, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Tongtong Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Cheng-Ren Li, Dalian Univ. of Technology (China)
Changlie Song, Dalian Univ. of Technology (China)


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