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Journal of Micro/Nanolithography, MEMS, and MOEMS

Effect of process parameters and packing density on development times for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography
Author(s): Kaushal Dhirendra Vora; Bor-Yuan Shew; Erol C. Harvey; J. P. Hayes; Andrew G. Peele
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Paper Abstract

We investigate the development time for densely packed high-aspect-ratio SU-8 structures. We find that a simple notch model as used by other workers to predict development time for isolated structures is inadequate for our case. We develop a theoretical model that allows the effects of mass transport of the resist in the developer to be included. By calibrating the process, we find that we are able to predict development time for our structures.

Paper Details

Date Published: 1 January 2007
PDF: 7 pages
J. Micro/Nanolith. 6(1) 013003 doi: 10.1117/1.2712868
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 6, Issue 1
Show Author Affiliations
Kaushal Dhirendra Vora, La Trobe Univ. (Australia)
Bor-Yuan Shew, National Synchrotron Radiation Research Ctr. (Taiwan)
Erol C. Harvey, Swinburne Univ. of Technology (Australia)
J. P. Hayes, Swinburne Univ. of Technology (Australia)
Andrew G. Peele, La Trobe Univ. (Australia)


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