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Journal of Micro/Nanolithography, MEMS, and MOEMS

Microchannels with rectangular and arched core shapes fabricated using sacrificial etching
Author(s): Jeffrey R. Lee; John Paul Barber; Zachary A. George; Milton L. Lee; Holger Schmidt; Aaron R. Hawkins
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Paper Abstract

A study of relevant fabrication parameters is presented for a process that uses chemical etching of sacrificial cores to produce long, hollow microchannels. Two different sacrificial materials are investigated, SU8 and reflowed photoresist. These two materials produce channel cross sections with rectangular and arch-shaped cores, respectively. Fabrication times based on etch removal rates of sacrificial materials are reported for SU8 core microchannels and for a hybrid core consisting of reflowed photoresist and aluminum layers. The hybrid design takes advantage of the fast etch times possible for aluminum, but also produces smooth, arched sidewalls. Structural integrity is also investigated for different microchannels, specifically the wall thickness required to produce an intact channel of a given width. Empirical design rules indicate that SU8-based core channels require a wall thickness-to-width ratio of greater than 1:10, and reflowed photoresist based structures require a ratio greater than 1:50.

Paper Details

Date Published: 1 January 2007
PDF: 7 pages
J. Micro/Nanolith. MEMS MOEMS 6(1) 013010 doi: 10.1117/1.2434990
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 6, Issue 1
Show Author Affiliations
Jeffrey R. Lee, Brigham Young Univ. (United States)
John Paul Barber, Brigham Young Univ. (United States)
Zachary A. George, Brigham Young Univ. (United States)
Milton L. Lee, Brigham Young Univ. (United States)
Holger Schmidt, Univ. of California/Santa Cruz (United States)
Aaron R. Hawkins, Brigham Young Univ. (United States)

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