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Optical Engineering

Through-focus technique for grating linewidth analysis with nanometer sensitivity
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Paper Abstract

We present a new algorithm for determining nano-scale feature dimensions of grating structures with a bright-field imaging tool. The algorithm is based on the intensity and focus quality of images obtained with varying amounts of defocus. Analysis of the intensity of optical images obtained at various focal positions demonstrates nanometer sensitivity with grating structures. An empirical quadratic model was developed to fit the experimental results of image intensity versus critical dimension.

Paper Details

Date Published: 1 December 2006
PDF: 6 pages
Opt. Eng. 45(12) 123602 doi: 10.1117/1.2404959
Published in: Optical Engineering Volume 45, Issue 12
Show Author Affiliations
Yi-Sha Ku, Industrial Technology Research Institute (Taiwan)
An-Shun Liu, Industrial Technology Research Institute (Taiwan)
Nigel Peter Smith, Hermes-Epitek Corp. (Taiwan)


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