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Optical Engineering

Investigation of the optical properties of sputtered ZnO films by reflectance spectroscopy
Author(s): Bo Huang; Jing Li; Donghui Guo; Suntao Wu
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Paper Abstract

ZnO films have been deposited on SiO2/Si substrates by rf magnetron sputtering. The rms roughness of the sample's surface was surveyed by using an atomic force microscope, and is less than 10 nm. The theoretical reflectance of the air/film/middle layer/substrate structure has been deduced. In the light of this theoretical reflectance, the complex refractive index ñ(λ)=n(λ)+ik(λ) of the sample below the interband absorption edge has been fitted with a Lorentz oscillator model. The absorption coefficient α(λ) of the sample is reported, and the result shows the sample has weak absorption around 490 nm.

Paper Details

Date Published: 1 December 2006
PDF: 5 pages
Opt. Eng. 45(12) 123801 doi: 10.1117/1.2402102
Published in: Optical Engineering Volume 45, Issue 12
Show Author Affiliations
Bo Huang, Xiamen Univ. (China)
Jing Li, Xiamen Univ. (China)
Donghui Guo, Xiamen Univ. (China)
Suntao Wu, Xiamen Univ. (China)

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