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Journal of Micro/Nanolithography, MEMS, and MOEMS

Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography
Author(s): Shyamala Subramanian; Jeffrey M. Catchmark
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Paper Abstract

Molecular ruler nanolithography combines conventional lithography techniques with chemical self-assembly methods to improve the resolution of the existing lithography tools. We demonstrate the implementation of molecular ruler nanolithography using sacrificial multilayer host structures defined by electron-beam lithography. Using this process, 40-nm metal features are produced using host features spaced 100 nm apart. Using a thicker sacrificial layer, 100-nm-thick daughter metal layers are also produced, demonstrating the flexibility of this technique.

Paper Details

Date Published: 1 October 2006
PDF: 5 pages
J. Micro/Nanolith. 5(4) 049701 doi: 10.1117/1.2401140
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 5, Issue 4
Show Author Affiliations
Shyamala Subramanian, The Pennsylvania State Univ. (United States)
Jeffrey M. Catchmark, The Pennsylvania State Univ. (United States)


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