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Optical Engineering

Microstructure- and composition-related characteristics of LaF3 thin films at 193 nm
Author(s): Ming-Chung Liu; Cheng-Chung Lee; Masaaki Kaneko; Kazuhide Nakahira; Yuuichi Takano
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Paper Abstract

The characteristics of lanthanum fluoride (LaF3) thin films deposited with a resistive heating (RH) boat and by e-beam gun evaporation at different substrate temperatures have been studied. The characteristics of the deposited films, including optical properties, stress, and laser-induced damage threshold (LIDT), were related to the microstructure as well as the stoichiometry of the film. The films exhibit obvious different characteristics between these two processes at various substrate temperatures. It was found that optical properties, stress, and LIDT were affected by the microstructure and composition of the films. To obtain a high value of the LIDT and good optical properties, LaF3 thin films should be deposited by the RH process at a substrate temperature of 300 °C.

Paper Details

Date Published: 1 August 2006
PDF: 6 pages
Opt. Eng. 45(8) 083801 doi: 10.1117/1.2227001
Published in: Optical Engineering Volume 45, Issue 8
Show Author Affiliations
Ming-Chung Liu, National Central Univ. (Taiwan)
Cheng-Chung Lee, National Central Univ. (Taiwan)
Masaaki Kaneko, Tochigi Nikon Corp. (Japan)
Kazuhide Nakahira, Tochigi Nikon Corp. (Japan)
Yuuichi Takano, Tochigi Nikon Corp. (Japan)

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