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Optical Engineering

Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks
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Paper Abstract

A novel method for measuring the imaging quality of a projection system with mirror-symmetric FOCAL marks is proposed, and the principle of the method is described. Through experiments, it is demonstrated that not only the axial aberrations but also the lateral aberrations can be measured with high accuracy by the method. The advantages of the method include obtaining more aberrations than the FOCAL technique and making it much simpler to perform a full-scale measurement of the imaging quality of a lithographic projection system.

Paper Details

Date Published: 1 May 2006
PDF: 5 pages
Opt. Eng. 45(5) 053201 doi: 10.1117/1.2202917
Published in: Optical Engineering Volume 45, Issue 5
Show Author Affiliations
Weijie Shi, Shanghai Institute of Optics and Fine Mechanics (China)
Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Dongqing Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Osami Sasaki, Niigata Univ. (Japan)


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