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Journal of Micro/Nanolithography, MEMS, and MOEMS

Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers
Author(s): Sasa Bajt; Zu Rong Dai; Erik J. Nelson; Mark A. Wall; Jennifer B. Alameda; Nhan Q. Nguyen; Sherry L. Baker; Jeffrey C. Robinson; John S. Taylor; Andrew L. Aquila; Nora V. Edwards
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Paper Abstract

The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, are investigated to establish their baseline structural, optical, and surface properties in an as-deposited state. The same capping layer structures are then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure is analyzed in detail with transmission electron microscopy (TEM). Compared to other Ru-capping layer preparations studied here, it is the only one that shows grains with preferential orientation. This information is essential to model and optimize the performance of EUVL multilayers.

Paper Details

Date Published: 1 April 2006
PDF: 13 pages
J. Micro/Nanolith. 5(2) 023004 doi: 10.1117/1.2201027
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 5, Issue 2
Show Author Affiliations
Sasa Bajt, Lawrence Livermore National Lab. (United States)
Zu Rong Dai, Lawrence Livermore National Lab. (United States)
Erik J. Nelson, Lawrence Livermore National Lab. (United States)
Mark A. Wall, Lawrence Livermore National Lab. (United States)
Jennifer B. Alameda, Lawrence Livermore National Lab. (United States)
Nhan Q. Nguyen, Lawrence Livermore National Lab. (United States)
Sherry L. Baker, Lawrence Livermore National Lab. (United States)
Jeffrey C. Robinson, Lawrence Livermore National Lab. (United States)
John S. Taylor, Lawrence Livermore National Lab. (United States)
Andrew L. Aquila, Lawrence Berkeley National Lab. (United States)
Nora V. Edwards, SEMATECH, Inc. (United States)


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