Journal of Micro/Nanolithography, MEMS, and MOEMS
Two-dimensional periodic potential via multiple-beam interferometry for atom lithography| Format | Member Price | Non-Member Price |
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Paper Abstract
We propose the use of square arrays of multiple atomic lenses, produced by interference of four nearly collinear optical beams in atom lithography using dipole force. Simulated lithographic patterns are reported for collimated as well as divergent rubidium atomic beam traveling in such square arrays of optical channels. The proposed configuration has the ability to write large numbers of periodic structures in square arrays in a single step.
Paper Details
Date Published: 1 April 2006
PDF: 5 pages
J. Micro/Nanolith. 5(2) 023005 doi: 10.1117/1.2201017
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 5, Issue 2
PDF: 5 pages
J. Micro/Nanolith. 5(2) 023005 doi: 10.1117/1.2201017
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 5, Issue 2
Show Author Affiliations
Kamlesh Mukundrao Alti, Indian Institute of Technology Guwahati (India)
Ardhendu Sekhar Patra, Indian Institute of Technology Guwahati (India)
Ardhendu Sekhar Patra, Indian Institute of Technology Guwahati (India)
Alika Khare, Indian Institute of Technology (India)
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