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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Editorial: Nanopatterning: Commercial and Technological Promise
Author(s): Kees Eijkel; Jill M. Hruby; Glenn D. Kubiak; Marion W. Scott; Volker Saile; Steven T. Walsh

Paper Details

Date Published: 1 January 2006
J. Micro/Nanolith. MEMS MOEMS 5(1) 011001 doi: 10.1117/1.2185657
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 5, Issue 1
Show Author Affiliations
Kees Eijkel, Univ. Twente (Netherlands)
Jill M. Hruby, Sandia National Labs. (United States)
Glenn D. Kubiak, Sandia National Labs. (United States)
Marion W. Scott, Sandia National Labs. (United States)
Volker Saile, Karlsruher Institut für Technologie (Germany)
Steven T. Walsh, The Univ. of New Mexico (United States)

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