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Journal of Micro/Nanolithography, MEMS, and MOEMS

Editorial: Nanopatterning: Commercial and Technological Promise
Author(s): Kees Eijkel; Jill M. Hruby; Glenn D. Kubiak; Marion W. Scott; Volker Saile; Steven T. Walsh
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Paper Abstract

This PDF file contains the editorial “Editorial: Nanopatterning: Commercial and Technological Promise” for JM3 Vol. 5 Issue 01

Paper Details

J. Micro/Nanolith. 5(1) 011001 doi: 10.1117/1.2185657
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 5, Issue 1, January 2006
Show Author Affiliations
Kees Eijkel, Univ. Twente (Netherlands)
Jill M. Hruby, Sandia National Labs. (United States)
Glenn D. Kubiak, Sandia National Labs. (United States)
Marion W. Scott, Sandia National Labs. (United States)
Volker Saile, Karlsruher Institut für Technologie (Germany)
Steven T. Walsh, The Univ. of New Mexico (United States)

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