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Journal of Micro/Nanolithography, MEMS, and MOEMS

Laser interference as a lithographic nanopatterning tool
Author(s): Cees J. M. van Rijn
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Paper Abstract

Laser interference lithography is reviewed as an adequate nanopatterning tool for devices with periodic structures. The structure size may practically be chosen in the range between 100 nm and 10.0 µm by adjusting the angle of incidence θ of the incoming laser beam. The exposure method is fast, inexpensive, and applicable for large areas. The method may be used to fabricate microsieves, shadow masks, calibration grids, and photonic crystals.

Paper Details

Date Published: 1 January 2006
PDF: 6 pages
J. Micro/Nanolith. 5(1) 011012 doi: 10.1117/1.2173269
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 5, Issue 1
Show Author Affiliations
Cees J. M. van Rijn, Technische Univ. Delft (Netherlands)

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