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Journal of Micro/Nanolithography, MEMS, and MOEMS

Sustained polymer membranes fabricated by nanoimprint lithography
Author(s): Helmut Schift; Sandro Bellini; Uwe Pieles; Jens Gobrecht
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Paper Abstract

Perforated polymer membranes are fabricated using nanoimprint lithography and a sacrificial layer technique. The membranes with micrometer-sized pores are partially released from the substrate by locally dissolving the underlying layer. Thus, large arrays with interconnected pores can be fabricated. This process can be applied to a wide selection of polymeric materials, and has the potential to be extended to submicrostructures.

Paper Details

Date Published: 1 January 2006
PDF: 5 pages
J. Micro/Nanolith. 5(1) 011010 doi: 10.1117/1.2172993
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 5, Issue 1
Show Author Affiliations
Helmut Schift, Paul Scherrer Institut (Switzerland)
Sandro Bellini, Politecnico di Milano (Italy)
Uwe Pieles, Fachhochschule beider Basel (Switzerland)
Jens Gobrecht, Paul Scherrer Institut (Switzerland)


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