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Journal of Micro/Nanolithography, MEMS, and MOEMS

Study of pattern placement error by thermal expansions in nanoimprint lithography
Author(s): Yifang Chen; Jiarui Tao; Xing-Zhong Zhao; Zheng Cui
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Paper Abstract

Pattern placement error (or pattern distortion) caused by different thermal expansions between templates and substrates in nanoimprint lithography is experimentally investigated. Using fabricated nanorulers, placement errors are quantitatively measured. Our results prove that nanoimprint lithography (NIL) with a heat cycle does have considerable error of pattern placement. But that is not the case with imprints at room temperature. This indicates that low-temperature or room-temperature imprints should be effective solutions.

Paper Details

Date Published: 1 January 2006
PDF: 3 pages
J. Micro/Nanolith. 5(1) 011002 doi: 10.1117/1.2172991
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 5, Issue 1
Show Author Affiliations
Yifang Chen, Rutherford Appleton Lab. (United Kingdom)
Jiarui Tao, Wuhan Univ. (China)
Xing-Zhong Zhao, Wuhan Univ. (China)
Zheng Cui, Rutherford Appleton Lab. (United Kingdom)


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