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Journal of Micro/Nanolithography, MEMS, and MOEMS

Microzone plates with high-aspect ratio fabricated by e-beam and x-ray lithography
Author(s): De-Qiang Wang; Leifeng Cao; Changqing Xie; Ming Liu; Tianchun Ye
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Paper Abstract

We introduce a combined e-beam and x-ray lithographic method to fabricate microzone plates (MZP) on free-standing silicon nitride films. An automatic design program is developed to draw the complex layout of MZP with very smooth boundaries. A gold MZP master mask with a minimum ring width of 250 nm is fabricated by e-beam lithography. The master mask is replicated using x-ray lithography (XRL) and nickel electroplating to obtain the final MZP. The combined lithographic technique produces a MZP with a pattern aspect ratio of 4.4:1.

Paper Details

Date Published: 1 January 2006
PDF: 5 pages
J. Micro/Nanolith. 5(1) 013002 doi: 10.1117/1.2170110
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 5, Issue 1
Show Author Affiliations
De-Qiang Wang, Institute of Microelectronics (China)
Leifeng Cao, Research Ctr. of Laser Fusion (China)
Changqing Xie, Institute of Microelectronics (China)
Ming Liu, Institute of Microelectronics (China)
Tianchun Ye, Institute of Microelectronics (China)


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