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Journal of Micro/Nanolithography, MEMS, and MOEMS

High-performance microfabricated angular rate sensor
Author(s): Tracy Dean Hudson; Sherrie W. Holt; Paul B. Ruffin; Michael S. Kranz; James W. McKee; Michael R. Whitley; Milan Buncick; Eric Tuck
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Paper Abstract

The development of a miniature angular rate sensor based on silicon-on-insulator (SOI) microfabrication technology is presented. The design, fabrication, integration, and inertial testing of a MEMS-based angular rate sensor with large dynamic range were the driving forces behind this research. The design goals of 10-deg/h bias stability while operating through 2000-deg/s roll environments are presented. The sensor design is based on a straightforward single-mask fabrication approach that utilizes deep reactive ion etching of a 100-µm-thick device layer, with a buried 2- to 3-µm oxide layer used as the sacrificial layer, in an SOI substrate. To date, the data show demonstrated bias drift performance of 60 deg/h over this fast-roll environment.

Paper Details

Date Published: 1 October 2005
PDF: 8 pages
J. Micro/Nanolith. 4(4) 043006 doi: 10.1117/1.2114787
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 4, Issue 4
Show Author Affiliations
Tracy Dean Hudson, U.S. Army Aviation and Missile Research, Development and Engineering Ctr. (United States)
Sherrie W. Holt, U.S. Army Aviation and Missile Research, Development and Engineering Ctr. (United States)
Paul B. Ruffin, U.S. Army Aviation and Missile Research, Development and Engineering Ctr. (United States)
Michael S. Kranz, Morgan Research Corp. (United States)
James W. McKee, Morgan Research Corp. (United States)
Michael R. Whitley, Morgan Research Corp. (United States)
Milan Buncick, The AEgis Technologies Group, Inc. (United States)
Eric Tuck, The AEgis Technologies Group, Inc. (United States)


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