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Journal of Micro/Nanolithography, MEMS, and MOEMS

MOEMS-based lithography for the fabrication of micro-optical components
Author(s): Lars Erdmann; Arnaud Deparnay; Gunter Maschke; Mario Längle; Robert Brunner
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Paper Abstract

We present a new method for the fabrication of diffractive and refractive micro-optical components. The method is suitable for high-quality rapid prototyping of optical components and allows the fast experimental test of designs for computer-generated holograms or refractive microstructures. Our method is based on employing a digital-multimirror device (DMD) as a switchable projection mask. The DMD is imaged into a photoresist layer using a Carl Zeiss lithography objective with a demagnification of 10:1 and a numerical aperture of 0.32 on the image side. The resulting pixel size is 1.368×1.368 µm. In comparison with laser direct writing with a single spot, our method is a parallel processing of nearly 800,000 pixels (1024×768 pixels). This fabrication method can be applied to all MOEMS components. The method adds a new dimension in MOEMS processing, reducing the fabrication complexity, and improves the flexibility of process simulation and design.

Paper Details

Date Published: 1 October 2005
PDF: 5 pages
J. Micro/Nanolith. 4(4) 041601 doi: 10.1117/1.2114647
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 4, Issue 4
Show Author Affiliations
Lars Erdmann, Carl Zeiss Jena GmbH (Germany)
Arnaud Deparnay, Carl Zeiss Jena GmbH (Germany)
Gunter Maschke, Carl Zeiss Jena GmbH (Germany)
Mario Längle, Carl Zeiss Jena GmbH (Germany)
Robert Brunner, Carl Zeiss Jena GmbH (Germany)

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