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Journal of Micro/Nanolithography, MEMS, and MOEMS

Short-wavelength ablation of molecular solids: pulse duration and wavelength effects
Author(s): Libor Juha; Michal Bittner; Dagmar Chvostova; Josef Krasa; Michaela Kozlov; Miroslav Pfeifer; Jiri Polan; Ansgar R. Präg; Bedrich Rus; Michal Stupka; Josef Feldhaus; Vit Letal; Zdenek Otcenasek; Jacek Krzywinski; Robert Nietubye; Jerzy B. Pelka; Andrzej Andrejczuk; Ryszard Sobierajski; Leszek Ryc; Frederick P. Boody; Henryk Fiedorowicz; Andrzej S. Bartnik; Janusz Mikolajczyk; Rafal Rakowski; Pavel Kubát; Ladislav Pína; Martin Horváth; Michael E. Grisham; Georgiy O. Vaschenko; Carmen S. Menoni; Jorge J. Rocca
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Paper Abstract

For conventional wavelength (UV-vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, ablation (etch) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various short-wavelength (λ<100 nm) lasers emitting pulses with durations ranging from ~10 fs to ~1 ns have recently been put into routine operation. This makes it possible to investigate how ablation characteristics depend on pulse duration in the XUV spectral region. Four sources of intense short-wavelength radiation available in the authors' laboratories, including XUV and soft x-ray lasers, are used for the ablation experiments. Based on the results of the experiments, the etch rates for three different pulse durations are compared using the XUV-ABLATOR code to compensate for the wavelength difference. Comparing the values of etch rates calculated for nanosecond pulses with those measured for shorter pulses, we can study the influence of pulse duration on XUV ablation efficiency. The results of the experiments also show that the ablation rate increases while the wavelength decreases from the XUV spectral region toward x-rays, mainly due to increase of attenuation lengths at short wavelengths.

Paper Details

Date Published: 1 July 2005
PDF: 11 pages
J. Micro/Nanolith. 4(3) 033007 doi: 10.1117/1.2037467
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 4, Issue 3
Show Author Affiliations
Libor Juha, Instytut Fizyki (Czech Republic)
Michal Bittner, Instytut Fizyki (Czech Republic)
Dagmar Chvostova, Instytut Fizyki (Czech Republic)
Josef Krasa, Instytut Fizyki (Czech Republic)
Michaela Kozlov, Instytut Fizyki (Czech Republic)
Miroslav Pfeifer, Instytut Fizyki (Czech Republic)
Jiri Polan, Instytut Fizyki (Czech Republic)
Ansgar R. Präg, Instytut Fizyki (Czech Republic)
Bedrich Rus, Instytut Fizyki (Czech Republic)
Michal Stupka, Instytut Fizyki (Czech Republic)
Josef Feldhaus, DESY--Deutsches Elektronen-Synchrotron (Germany)
Vit Letal, Instytut Fizyki (Czech Republic)
Zdenek Otcenasek, Instytut Fizyki (Czech Republic)
Jacek Krzywinski, Instytut Fizyki (Poland)
Robert Nietubye, Polska Akademia Nauk (Poland)
Jerzy B. Pelka, Instytut Fizyki (Poland)
Andrzej Andrejczuk, Deutsches Elektronen Synchrotron (Germany)
Ryszard Sobierajski
Leszek Ryc
Frederick P. Boody
Henryk Fiedorowicz
Andrzej S. Bartnik
Janusz Mikolajczyk
Rafal Rakowski
Pavel Kubát
Ladislav Pína
Martin Horváth
Michael E. Grisham
Georgiy O. Vaschenko
Carmen S. Menoni
Jorge J. Rocca

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