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Journal of Micro/Nanolithography, MEMS, and MOEMS

General model for estimating bubble dissolution and droplet evaporation times
Author(s): Timothy A. Shedd
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Paper Abstract

Bubbles and droplets may be detrimental to the successful implementation of immersion lithography, depending in part on their lifetime in the system. In this work, a model is developed to estimate the dissolution times of nitrogen bubbles in pure water that may be free-floating or adhered to a solid surface. The model is then extended to small free and adhered droplets. Bubble dissolution and droplet evaporation times for typical immersion lithography conditions are presented.

Paper Details

Date Published: 1 July 2005
PDF: 8 pages
J. Micro/Nanolith. MEMS MOEMS 4(3) 033004 doi: 10.1117/1.2037427
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 4, Issue 3
Show Author Affiliations
Timothy A. Shedd, Univ. of Wisconsin/Madison (United States)


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