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Optical Engineering • Open Access

Design and fabrication of compact nonblocking 4×4 optical matrix switch on silicon-on-insulator by anisotropic chemical etching
Author(s): Jingwei Liu; Jinzhong Yu; Shaowu Chen; Zhiyong Li

Paper Abstract

A folding nonblocking 4×4 optical matrix switch in simplified-tree architecture was designed and fabricated on a silicon-on-insulator wafer. To compress chip size, switch elements (SEs) were connected by total internal reflection mirrors instead of conventional S-bends. For obtaining smooth interfaces, potassium hydroxide (KOH) anisotropic chemical etching of silicon was employed. The device has a compact size of 20×3.2 mm2 and a fast response of 8±1 µs. Power consumption of 2×2 SE and excess loss per mirror were 145 mW and –1.1 dB, respectively.

Paper Details

Date Published: 1 July 2005
PDF: 3 pages
Opt. Eng. 44(7) 070503 doi: 10.1117/1.1978944
Published in: Optical Engineering Volume 44, Issue 7
Show Author Affiliations
Jingwei Liu, Institute of Semiconductors (China)
Jinzhong Yu, Institute of Semiconductors (China)
Shaowu Chen, Institute of Semiconductors (China)
Zhiyong Li, Institute of Semiconductors (China)

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