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Optical Engineering

On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses
Author(s): Mark Mero; Benjamin R. Clapp; Jayesh C. Jasapara; Wolfgang G. Rudolph; Detlev Ristau; Kai Starke; Jörg Krüger; Sven Martin; Wolfgang Kautek
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Paper Abstract

The physical effects reducing the damage threshold of dielectric films when exposed to multiple femtosecond pulses are investigated. The measured temperature increase of a Ta2O5 film scales exponentially with the pulse fluence. A polarized luminescence signal is observed that depends quadratically on the pulse fluence and is attributed to two-photon excitation of self-trapped excitons that form after band-to-band excitation. The damage fluence decreases with increasing pulse number, but is independent of the repetition rate from 1 Hz to 1 kHz at a constant pulse number. The repetition rate dependence of the breakdown threshold is also measured for TiO2, HfO2, Al2O3, and SiO2 films. A theoretical model is presented that explains these findings.

Paper Details

Date Published: 1 May 2005
PDF: 7 pages
Opt. Eng. 44(5) 051107 doi: 10.1117/1.1905343
Published in: Optical Engineering Volume 44, Issue 5
Show Author Affiliations
Mark Mero, The Univ. of New Mexico (United States)
Benjamin R. Clapp, The Univ. of New Mexico (United States)
Jayesh C. Jasapara, OFS Fitel Labs. (United States)
Wolfgang G. Rudolph, The Univ. of New Mexico (United States)
Detlev Ristau, Laser Zentrum Hannover e.V. (Germany)
Kai Starke, Laser Zentrum Hannover e.V. (Germany)
Jörg Krüger, Bundesanstalt für Materialforschung und -prüfung (Germany)
Sven Martin, Bundesanstalt für Materialforschung und -prüfung (Germany)
Wolfgang Kautek, Univ. Wien (Austria)

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