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Journal of Micro/Nanolithography, MEMS, and MOEMS

Fabrication of silicon microring resonators with narrow coupling gaps
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Paper Abstract

We demonstrate fabrication of silicon microring resonators with narrow coupling gaps using electron-beam lithography followed by lift-off process. Microring resonators of different diameters and 58 nm coupling gaps are fabricated in a silicon-on-insulator water. These devices are then characterized using a tunable laser source. For the microring resonator with a diameter of 7.5 µm, the measured maximum transmission is 88%, the free spectra range is 25 nm, the finesse is 28, and the Q factor is 1715.

Paper Details

Date Published: 1 April 2005
PDF: 5 pages
J. Micro/Nanolith. 4(2) 023013 doi: 10.1117/1.1898605
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 4, Issue 2
Show Author Affiliations
Binglin Miao, Univ. of Delaware (United States)
Peng Yao, Univ. of Delaware (United States)
Janusz A. Murakowski, Univ. of Delaware (United States)
Dennis W. Prather, Univ. of Delaware (United States)


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