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Journal of Micro/Nanolithography, MEMS, and MOEMS

Extreme ultraviolet lithography: overview and development status
Author(s): Peter J. Silverman
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Paper Abstract

Extreme ultraviolet (EUV) lithography has emerged as the most likely successor to 193-nm lithography. We provide a technical overview of EUV lithography and a discussion of the advantages of EUV lithography over alternative technologies. The key challenges in developing EUV exposure tools for high-volume production are discussed. A brief assessment is given of the cost of ownership of EUV lithography in comparison with 193-nm immersion lithography.

Paper Details

Date Published: 1 January 2005
PDF: 5 pages
J. Micro/Nanolith. MEMS MOEMS 4(1) 011006 doi: 10.1117/1.1862647
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 4, Issue 1
Show Author Affiliations
Peter J. Silverman, Intel Corp. (United States)

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