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Journal of Micro/Nanolithography, MEMS, and MOEMS

Nanocomposite approaches toward pellicles for 157-nm lithography
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Paper Abstract

Pellicle materials for use at 157 nm must display sufficient transparency at this wavelength and adequate lifetimes to be useful. We blended a leading candidate fluoropolymer with silica nanoparticles to examine the effect on both the transparency and lifetime of the pellicle. It is anticipated that these composite materials may increase the lifetime by perhaps quenching reactive species and/or by dilution, without severely decreasing the 157-nm transmission. Particles surface-modified with fluorinated moieties are also investigated. The additives are introduced as stable nanoparticle dispersions to casting solutions of the fluoropolymers. The properties of these solutions, films, and the radiation-induced darkening rates are reported. The latter are reduced in proportion to the dilution of the polymer, but there is no evidence that the nanoparticles act as radical scavengers.

Paper Details

Date Published: 1 January 2005
PDF: 6 pages
J. Micro/Nanolith. 4(1) 013004 doi: 10.1117/1.1858131
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 4, Issue 1
Show Author Affiliations
Vladimir Liberman, MIT Lincoln Lab. (United States)
Jan H. C. Sedlacek, MIT Lincoln Lab. (United States)
Theodore H. Fedynyshyn, MIT Lincoln Lab. (United States)
Russell B. Goodman, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
Roger F. Sinta, J & J Chemical Consulting (United States)


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