Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS

Blazed silicon gratings fabricated by deflecting crystal orientation (111) silicon wafer
Author(s): Hui Ju; Ping Zhang; Jingqiu Liang; Shurong Wang; YiHui Wu
Format Member Price Non-Member Price
PDF $20.00 $25.00

Paper Abstract

Bulk silicon wet etching can be used to fabricate silicon gratings. Wet etching depends on the anisotropic property of monocrystalline silicon. Blazed gratings for different spectral ranges can be fabricated by this method, and facets of grooves are formed by crystallographic planes of the monocrystalline silicon wafer. We develop a method to fabricate blazed gratings using deflecting crystal orientation (111) silicon wafers. The topographies of the samples are measured by SEM and atomic force microscopy (AFM), and the results indicate that the samples have grooves of good uniformity and facets of excellent optical quality.

Paper Details

Date Published: 1 January 2005
PDF: 4 pages
J. Micro/Nanolith. 4(1) 019701 doi: 10.1117/1.1857533
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 4, Issue 1
Show Author Affiliations
Hui Ju, Wakayama Univ (Japan)
Ping Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jingqiu Liang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Shurong Wang, Changchun Institute of Optics,Fine Mechanics & Phy (China)
YiHui Wu, Changchun Institute of Optics,Fine Mechanics & Phy (China)


© SPIE. Terms of Use
Back to Top