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Optical Engineering

Ellipsometry on optically thin palladium films on silicon-based substrate: effects of low concentration of hydrogen
Author(s): Emmanouil Lioudakis; Andreas Othonos
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Paper Abstract

Optically thin palladium films evaporated on silicon substrates are investigated following exposure to low concentrations of hydrogen gas in nitrogen using spectroscopic ellipsometry. Changes in the parameters tan Ψ and cos Δ are observed for concentrations as low as 0.01% hydrogen in nitrogen. A nonlinear behavior of the change in the ellipsometry parameters as a function of hydrogen concentration is demonstrated, with saturation occurring at a flow of 0.05% hydrogen in nitrogen.

Paper Details

Date Published: 1 February 2005
PDF: 4 pages
Opt. Eng. 44(2) 023802 doi: 10.1117/1.1840955
Published in: Optical Engineering Volume 44, Issue 2
Show Author Affiliations
Emmanouil Lioudakis, Univ. of Cyprus (Cyprus)
Andreas Othonos, Univ. of Cyprus (Cyprus)

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