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Optical Engineering

Ellipsometry on optically thin palladium films on silicon-based substrate: effects of low concentration of hydrogen
Author(s): Emmanouil Lioudakis; Andreas Othonos
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Paper Abstract

Optically thin palladium films evaporated on silicon substrates are investigated following exposure to low concentrations of hydrogen gas in nitrogen using spectroscopic ellipsometry. Changes in the parameters tan and cos are observed for concentrations as low as 0.01% hydrogen in nitrogen. A nonlinear behavior of the change in the ellipsometry parameters as a function of hydrogen concentration is demonstrated, with saturation occurring at a flow of 0.05% hydrogen in nitrogen.

Paper Details

Date Published: 1 February 2005
PDF: 4 pages
Opt. Eng. 44(2) 023802 doi: 10.1117/1.1840955
Published in: Optical Engineering Volume 44, Issue 2
Show Author Affiliations
Emmanouil Lioudakis, Univ. of Cyprus (Cyprus)
Andreas Othonos, Univ. of Cyprus (Cyprus)


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