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Optical Engineering

Profile control technology for high-performance microlens array
Author(s): Chunlei Du; Xiaochun Dong; Chuankai Qiu; Qiling Deng; Chongxi Zhou
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Paper Abstract

A profile formation and control approach has been developed for manufacturing micro-optical elements with continuous profile and deep relief depth. Based on Dill's exposure model, an effective expression for determining the exposure dose function is established by using a supposition of equivalent exposure threshold inside a resist layer. An analytical simplified formula is further deduced by taking absorbance as constant B, and the approximate condition is discussed. For evaluating the simplified formula, the profile error was calculated and analyzed by simulation. With the exposure dose function, the binary mask for manipulating the light distribution by means of a moving-mask lithographic method can be designed. Experimental results are given and show the comparative performance to the required profile and relief depth. A series of refractive microlens arrays with aspherical profiles, a wide range of numerical apertures (0.005 to 0.6), and high fill factors were accomplished in the lab and may be applied to many systems.

Paper Details

Date Published: 1 November 2004
PDF: 8 pages
Opt. Eng. 43(11) doi: 10.1117/1.1805563
Published in: Optical Engineering Volume 43, Issue 11
Show Author Affiliations
Chunlei Du, Institute of Optics and Electronics (China)
Xiaochun Dong, Institute of Optics and Electronics (China)
Chuankai Qiu, Institute of Optics and Electronics (China)
Qiling Deng, Institute of Optics and Electronics (China)
Chongxi Zhou, Institute of Optics and Electronics (China)


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