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Optical Engineering

Blazed binary diffractive gratings with antireflection coating for improved operation at 10.6 μm
Author(s): Mane-Si Laure Lee; Pierre Legagneux; Philippe Lalanne; Jean-Claude Rodier; Patrick Gallais; Chantal Germain; Joël Rollin
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Paper Abstract

We report on the design fabrication and characterization a 3-λperiod grating composed of subwavelength ridges of progressively varying widths for operation at 10.6 μm. The grating is blazed into the first transmitted order (an efficiency of 80% is measured) under TM polarization and over a broad range of angles of incidence. The fabrication involves contact photolithography, reactive-ion etching, and an evaporation deposition over the etched structure. The result validates the use of photolithography, a low-cost technology, for the manufacture of efficient blazed binary diffractive elements for thermal imaging (the 8- to 12-μm IR band).

Paper Details

Date Published: 1 November 2004
PDF: 6 pages
Opt. Eng. 43(11) doi: 10.1117/1.1802253
Published in: Optical Engineering Volume 43, Issue 11
Show Author Affiliations
Mane-Si Laure Lee, Thales Research & Technology (France)
Pierre Legagneux, Thales Research & Technology (France)
Philippe Lalanne, Univ. Paris-Sud (France)
Jean-Claude Rodier, Univ. Paris-Sud (France)
Patrick Gallais, Thales Angenieux (France)
Chantal Germain, Thales Angenieux SA (France)
Joël Rollin, Thales Angénieux SA (France)

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