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Optical Engineering

Characterization of the gray-scale photolithography with high-resolution gray steps for the precise fabrication of diffractive optics
Author(s): Ying Tsung Lu; Chang-Sheng Chu; Hoang Yan Lin
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Paper Abstract

To fabricate a diffractive optical element (DOE) with optimum surface profile, we characterize the relation between the developed height profile on the photoresist and the optical density (OD) value of a high-energy-beam-sensitive (HEBS) gray-scale photomask with high-resolution gray steps. The lithography characteristics of a gray step less than 10 µm are inspected in detail. The gray patterns with various gray-step widths are fabricated for the investigation of the relation between the OD values and the height profiles on the specific photoresist. We demonstrate the dependence of the photoresist height profiles on the width of the gray step, and this dependence agrees well with the simulation results from our model. We provide a proper method to design the OD value of a gray-scale photomask for the fabrication of DOEs with precise surface profiles.

Paper Details

Date Published: 1 November 2004
PDF: 5 pages
Opt. Eng. 43(11) doi: 10.1117/1.1801411
Published in: Optical Engineering Volume 43, Issue 11
Show Author Affiliations
Ying Tsung Lu, Industrial Technology Research Institute (Taiwan)
Chang-Sheng Chu, Industrial Technology Research Institute (China)
Hoang Yan Lin, Industrial Technology Research Institute (Taiwan)

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