Share Email Print

Journal of Micro/Nanolithography, MEMS, and MOEMS

Source optimization for image fidelity and throughput
Author(s): Yuri Granik
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In this study we first review existing source optimization methods. Lack of rigorous formulations motivates discussion of the optimization objectives and constraints. We stress the importance of using weighted and so-called Sobolev norms. Second, we state the main optimization problem as a set of the optimization objectives in a form of functional norm integrals to maximize image fidelity and source smoothness. We reduce this to a non-negative least square (NNLS) problem, which is solved by standard numerical methods. Third, we analyze solutions for important practical cases: alternating phase shifting applied to regular and semiregular pattern of contact holes, two types of SRAM cells with design rules from 130 to 250 nm, and a complex semidense contact layer pattern. Finally, we show how constraint optimization can be used to smooth strong off-axis quadrupole illuminations to achieve better image fidelity for some selected layout patterns.

Paper Details

Date Published: 1 October 2004
PDF: 14 pages
J. Micro/Nanolith. 3(4) doi: 10.1117/1.1794708
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 3, Issue 4
Show Author Affiliations
Yuri Granik, Mentor Graphics Corp. (United States)

© SPIE. Terms of Use
Back to Top