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Journal of Micro/Nanolithography, MEMS, and MOEMS

Continuous-tone grayscale mask fabrication using high-energy-beam-sensitive glass
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Paper Abstract

For highest efficiency optical devices, it is desirable to form continuously graded device features. We describe a technique to produce such features through the fabrication of a continuous-tone grayscale mask and subsequent grayscale photolithography. The design of the mask fabrication process is outlined, including the high-energy-beam-sensitive (HEBS) glass electron-beam exposure response characterization, and the generation of an exposure profile with inherent proximity effect correction. Application of the process is demonstrated through fabrication of smooth-facet retroreflectors, with features that are not possible to produce either by a grayscale process that employs discreet gray levels or by anisotropic wet etch techniques.

Paper Details

Date Published: 1 October 2004
PDF: 5 pages
J. Micro/Nanolith. 3(4) doi: 10.1117/1.1793156
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 3, Issue 4
Show Author Affiliations
Thomas E. Dillon, Univ. of Delaware (United States)
Anita Sure, Univ. of Delaware (United States)
Janusz A. Murakowski, Univ. of Delaware (United States)
Dennis W. Prather, Univ. of Delaware (United States)

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