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Journal of Micro/Nanolithography, MEMS, and MOEMS

Electron beam mastering process realized over a 100-GB/layer capacity disk
Author(s): Minoru Takeda; Motohiro Furuki; Masanobu Yamamoto; Masataka Shinoda; Kimihiro Saito; Yuichi Aki; Hiroshi Kawase; Mitsuru Koizumi; Toshiaki Miyokawa; Masao Mutou
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Paper Abstract

We demonstrate the capability of 100-GB density recording by electron beam mastering and readout by a near-field optical pickup with an effective NA of 2.05 and a blue LD of 405-nm wavelength. A silicon (Si) disk of 100-GB density is fabricated by an optimized Si etching process condition to form suitable pit pattern shapes for the near-field readout.

Paper Details

Date Published: 1 October 2004
PDF: 5 pages
J. Micro/Nanolith. 3(4) doi: 10.1117/1.1793154
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 3, Issue 4
Show Author Affiliations
Minoru Takeda, Sony Corp. (Japan)
Motohiro Furuki, Sony Corp. (Japan)
Masanobu Yamamoto, Sony Corp. (Japan)
Masataka Shinoda, Sony Corp. (Japan)
Kimihiro Saito, Sony Corp. (Japan)
Yuichi Aki, Sony Corp. (Japan)
Hiroshi Kawase, Sony Corp. (Japan)
Mitsuru Koizumi
Toshiaki Miyokawa
Masao Mutou


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