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Optical Engineering

Fabrication and characterization of ridge structures in LiNbO3 for optical components
Author(s): R. Chakraborty; J. C. Biswas; S. K. Lahiri
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Paper Abstract

We describe the fabrication and characterization of ridge structure on Z-cut LiNbO3 substrates. Titanium strip patterns are formed using conventional photolithography and are used as a mask. The unmasked portions are then proton exchanged. As proton-exchanged LiNbO3 have a much higher etch rate than bulk LiNbO3, these portions are etched away easily by a suitable etchant, leaving a ridge structure along the masked portion. Different characterizations have been done both before and after annealing the proton exchanged areas. These ridge structures can be used for making broadband modulators.

Paper Details

Date Published: 1 August 2004
PDF: 4 pages
Opt. Eng. 43(8) doi: 10.1117/1.1758270
Published in: Optical Engineering Volume 43, Issue 8
Show Author Affiliations
R. Chakraborty, Virginia Polytechnic Institute and State Univ. (United States)
J. C. Biswas, Indian Institute of Technology/Kharagpur (India)
S. K. Lahiri, Indian Institute of Technology (India)

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