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Journal of Micro/Nanolithography, MEMS, and MOEMS

Hot-Lot Equivalent of Technology Development—Immersion Lithography
Author(s): Burn J. Lin
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Paper Details

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J. Micro/Nanolith. 3(2) doi: 10.1117/1.1695567
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 3, Issue 2, April 2004
Show Author Affiliations
Burn J. Lin, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)


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