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Journal of Micro/Nanolithography, MEMS, and MOEMS

Effects of reticle reflectance on lithography
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Paper Abstract

We report in this work both experimental and theoretical results showing the effects of reticle absorber reflectivity on standard flare measurements, image formation, and how this may contribute to various image metrics used in lithography. Our study shows that under typical conditions the reflectance from the absorber film has only a small effect on the image produced by the exposure system and therefore should not limit lithography.

Paper Details

Date Published: 1 April 2004
PDF: 6 pages
J. Micro/Nanolith. MEMS MOEMS 3(2) doi: 10.1117/1.1668268
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 3, Issue 2
Show Author Affiliations
Kevin D. Cummings, ASML (United States)
Bernd Geh, Carl Zeiss (United States)
Bing Lu, Motorola, Inc. (United States)
James R. Wasson, Motorola, Inc. (United States)
Pawitter J.S. Mangat, Motorola, Inc. (United States)

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